INDEX OF REFRACTION VERSUS OXYGEN PARTIAL PRESSURE FOR TANTALUM OXIDE AND SILICON DIOXIDE FILMS PRODUCED BY ION BEAM DEPOSITION INDEX OF REFRACTION VERSUS OXYGEN PARTIAL PRESSURE FOR TANTALUM OXIDE AND SILICON DIOXIDE FILMS PRODUCED BY ION BEAM DEPOSITION
Data source
Japan Atomic Energy Agency's Library Catalog
A search system for the collections of the Japan Atomic Energy Agency central library. Books, reports, meeting materials, magazines and dockets collected by the library are searchable.
Last updated
September 19, 2022